The wafer-scale automated electrochemical Atomic Layer Deposition (eALD) system is an ideal tool to grow nanomaterials atomic layer by atomic layer by using surface limited chemical reactions (the phenomenon also known as an under potential deposition). Although similar to certain degree to more common vacuum Atomic Layer Deposition technique, eALD offers a number of unique advantages particularly for deposition of superlattices (for a nonlimiting example, PbTe/PbSe or Bi2Te3/Sb2Te3), where such superlattices can be grown at a single temperature quickly, while classical ALD due to different temperatures of depositions of individual materials require temperature adjustment of the system, resulting in lengthy and not very practical process.
In eALD, atomic monolayers are formed on the surface during exposure to the proper solution and potential. Between different deposition cycles the surface of the substrate is exposed to the buffer solution that is used to remove the non-specifically bound species from the surface. By repeating these cycles the designed nanomaterial can be formed.
To provide uniform and good quality nanomaterials and nanostructures MicroXact developed an automated tool that has the following unique features:
The IR Seebeck Characterization Systems are capable of measuring the Seebeck coefficient and electrical resistivity of a wide range of samples. Common Seebeck characterization devices available from other companies are restricted to bridge-type in-plane samples or other limited geometries. MicroXact’s system allows you to measure cross-plane through thin-films and across complex 3D structures as well as characterizing the voltage response to an applied current. By measuring the cross-plane value of thin-film thermoelectrics, this system gives you the unique capability of measuring the thermoelectric material in the same configuration that it would be used in a device. These unique systems can be designed to be capable of measuring over extremely wide temperature ranges from below 4K to over 800K.