Description
FEATURES
- Infrared heating of sample
- Same motion control and automation capabilities as the SPS-2800
- Contact and non-contact temperature measurement capabilities
- High vacuum capable
- Systems can be designed to operate from slightly below 4K to over 800K
- Available with 3D magnetic field control to 0.6T or suppression
- Available with humidity monitoring and control
SPECIFICATIONS
ASM-200
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Wafer Size
Up to 200mm
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Sample Geometry
Thin films and 3D structures
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Non-contact Temperature Measurement
0.01K precision
Adjustable emissivity
150ms sampling interval -
Infrared Heating
Up to 5000 W/m2
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Temperature Operating Range
4K-800K
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Software Control
LabView-based, Windows-compatible
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Output
Seebeck Coefficient and Electrical Resistivity/IV-Curve

