ACV-2200
The ACV systems provide 100% non-contact, non-destructive measurements for epi layer resistivity by patented technology. The physics behind the measurement is quite similar to C-V Schottky or Hg-probe, and thus the output is a traditional C-V doping profile. The difference is that the electrode does not touch the wafer, resulting in substantial cost savings of monitor wafers.
The model includes complete automation, powerful software and excellent measurement repeatability.
ACV-3000
The ACV systems provide 100% non-contact, non-destructive measurements for epi layer resistivity by patented technology. The physics behind the measurement is quite similar to C-V Schottky or Hg-probe, and thus the output is a traditional C-V doping profile. The difference is that the electrode does not touch the wafer, resulting in substantial cost savings of monitor wafers.
The model includes complete automation, powerful software and excellent measurement repeatability.
ACV-3100
The ACV systems provide 100% non-contact, non-destructive measurements for epi layer resistivity by patented technology. The physics behind the measurement is quite similar to C-V Schottky or Hg-probe, and thus the output is a traditional C-V doping profile. The difference is that the electrode does not touch the wafer, resulting in substantial cost savings of monitor wafers.
The model includes complete automation, powerful software and excellent measurement repeatability.
Centurion (40 mJ)
The Centurion is an air cooled, diode pumped laser, delivering 40 mJ energy in nanosecond pulses at repetition rates up to 100 Hz. Diode pumping reduces size, improves reliability, and eliminates most maintenance requirements.
Centurion (50 mJ)
The Centurion + is an air cooled, diode pumped laser, delivering 50 mJ energy in nanosecond pulses at repetition rates up to 100 Hz. Diode pumping eliminates the need of water, reduces size, improves reliability, and eliminates most maintenance requirements.
- Stable pulse energy in burst mode
- Variable attenuator and non-linear crystals integrated in laser head
- Homogeneous near field beam intensity profiles
CFR (200-400 mJ)
The CFR laser is a lamp pumped Nd:YAG laser featuring a degree of ruggedization not found in typical scientific lasers. The CFR design has been vibration tested and each laser is temperature cycled overnight, and tested again before shipping to ensure the laser arrives aligned and ready for use.
- 1064, 532, 355, 266, 213 nm and 1.57 µm available
- Alignment guaranteed
- Quick umbilical disconnects
- Compact and portable
- Gaussian or multimode resonators
- 50 million shots lamp lifetime guaranteed
- Built to withstand harsh environments
Chemchek KPA-11
Chemchek’s Kinetic Phosphorescence Analyzer (KPA) provides sensitive, precise and economical analysis for trace uranium and lanthanides.
CLS
FAST NON-CONTACT MATERIAL CHARACTERIZATION AND PROCESS CONTROL
Emitter sheet resistance is a primary quality control parameter for silicon wafers in PV applications after emitter diffusion.
The CLS models, CLS-1A, CLS-3A, and CLS-5A, Emitter Sheet Resistance Testers allow measurement of sheet resistance at 1 to 5 points with the high throughput that meets the requirements of in-line quality control in fully automated cell production lines.
The CMS models, CMS-1A, CMS-3A, Emitter Sheet Resistance Testers allow measurement of wafers “on the fly”, i.e. conveyor belt does not stop during measurement. Therefore, they have the high throughput that meets the requirement of in-line quality control in fully automated cell production lines.
CMS
FAST NON-CONTACT MATERIAL CHARACTERIZATION AND PROCESS CONTROL
Emitter sheet resistance is a primary quality control parameter for silicon wafers in PV applications after emitter diffusion.
The CLS models, CLS-1A, CLS-3A, and CLS-5A, Emitter Sheet Resistance Testers allow measurement of sheet resistance at 1 to 5 points with the high throughput that meets the requirements of in-line quality control in fully automated cell production lines.
The CMS models, CMS-1A, CMS-3A, Emitter Sheet Resistance Testers allow measurement of wafers “on the fly”, i.e. conveyor belt does not stop during measurement. Therefore, they have the high throughput that meets the requirement of in-line quality control in fully automated cell production lines.